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Allwin21 Corp. focuses on and professionally­ provides the following fully refurbished or rebuilt sputtering equipment with high Quality,right­ Cost,quick Delivery and excelent Service for Semiconductor­ industry,MEMS,­ Biomedical, Nanotechnology,S­olar,LEDs etc.

AccuSputter AW 4450 | Perkin Elmer 4450 | Perkin Elmer 4410 | Perkin Elmer 2400

We are able to provide the following Perkin Elmer used sputtering equipment and perform full service for earlier and later models including Refurbishment,­ upgrade,Repair,­ and/or Preventive Maintenance.­

•Perkin­ Elmer2410 Sputtering System
•Perkin­ Elmer4400 Sputtering System
•Perkin­ Elmer4410 Sputtering System
•Perkin­ Elmer4450 Sputtering System
•Perkin­ Elmer2410 Sputtering System
•Perkin­ Elmer4480 Sputtering System

The 4450 Series system for sputtering and etching reflects an advanced design concept based on a high capacity Load Lock that permits wafer loading without breaking vacuum in the process chamber.

Created specifically­ for the production environment,­ the 4450 system provides significant advantages to combine high yield and high throughput resulting in product excllence. The means to handle various thin film coating or etching requirement is accomplished­ by a broad range of operating modes including: DC Magnetron, RF Magnetron, RF Diode, Bias Sputter, Reactive Sputter, and Sputter Etch.

High Throughput

Quick production cycles are achieved by a fast cycle Load Lock and an efficiently high vacuum pumped Process Chamber. Aluminum alloy deposition rates as high as 200 Å per kW per minute are possible with the Delta™­ target system, resulting in production rates exceeding 150 three inch wafers per hour.

High Yield

A rotating substrate table for multi-pass deposition ensures high-uniformity­ films and run-to-run repeatability,­ allowing the total control of critical film characteristics.­ The mechanical design specifically­ minimizes generation of particles that could cause pinhole defects. Wafer breakage is reduced by easy loading pallet design. Reproducible­ high quality films are guaranteed through the routine achievement of clean vacuum conditions.
The 4450 Series systems enables the deposition of excellent films with aluminum, aluminum alloys, platinum silicide, titanium-tungste­n, nichrome-gold,­ silicon nitride, silicon dioxide, chrome disilicide, and permalloy.

Step coverage: Vertical to horizontal can approach 70% and is typically better than 50% even with high or undercut steps.

Specularity:­ Reflectivity­ as a measure of specularity is at least 60% and can be as good as 80%.
Resistivity:­ Bulk resistivity is essentially achievable for AI and Al-alloy films with typical values ranging from 2.8 to 2.9 µ&#84­86;/cm.

System Capabilities­

A considerable­ choice of target materials, machine operating modes, pressure and gas controls, cathode configurations­ and power levels are available in the 4450 Series. This versatility provides an unprecedented­ capacity to perform a wide variety of thin film tasks.